Tolubaev K, Zhautikov B, Zobnin N, Dairbekova G, Kabieva S, Al-Kasasbeh R. Modeling the influence of technological parameters of the magnetron sputtering process using the Caroline D12C system on the proportion of nanocrystallites in the structure of thin silicon films. Kompl. Ispolz. Min. Syra = Compl. Use of Min. Resour. [Internet]. 2024 Jul. 12 [cited 2026 Feb. 18];334(3):51-8. Available from: https://kims-imio.com/index.php/main/article/view/482